| 1. | Due to great advantage of the excimer laser in photoelectron material , photoelectron technology research , so in this thesis , a xecl excimer laser is designed in order to solve some problem in semiconductor film , cmr film , quartz film and other kind of film application , optical etching field , interaction between laser and material , material plasma study . the parameters of the excimer laser is e also measured and analyzed
因此本文以气相沉积、外延生长、巨磁薄膜、金刚石及其它薄膜制备及后续的光刻，激光与物质的相互作用，等离子体研究为目的，研制获得了激光脉宽18ns ，单脉冲能量150mj ，矩形光斑大小2cm 1cm ，束散角3mrad ，最高重复频率5hz的xecl准分子激光器。 |
